The Pulsed Microplasma Cluster Source (PMCS) is a high-intensity nanoparticle source, for vacuum thin film deposition. Two vacuum chambers compose the deposition system: the expansion chamber for the supersonic beam generation and the deposition chamber for the collection of the nanoparticles over the substrates.
PMCS operation is based on the localized erosion of a rotating conductive cathode by means of a microplasma. Thereby, the sputtered material is evaporated into a carrier gas (usually an inert gas, but reactive mixtures can be used too) that it is pulsed into the expansion chamber.
The architecture is designed to limit the overall dimensions and it is equipped with a unit for the remote control of the system.
For the working process video, click
here 
PMCS feature
- The starting material for nanoparticles generation can be any electrically conducting material available into rod-shape (i.e. iron, molybdenum, tin, titanium, tungsten and noble metals; non-metallic materials such as carbon graphitic or doped silicon; composite cathodes).
- This system allows a real time control of the thin film growth. Deposition thickness from sub-monolayers dispersed nanoparticles up to several microns can be achieved.
